The 64th JSAP Spring Meeting, 2017

Presentation information

Print

Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

[17a-313-1~10] 8.4 Plasma etching

Fri. Mar 17, 2017 9:00 AM - 11:30 AM 313 (313)

Koji Eriguchi(Kyoto Univ.)

9:00 AM - 9:15 AM

[17a-313-1] Etching of amorphous carbon layer (a-C) by fluorine and fluorocarbon ions (F+, CF+, CF3+)

〇Kazuhiro Karahashi1, Hu Li1, Kentaro Yamada1, Tomoko Ito1, Satoshi Numazawa2, Ken Machida2, Kiyoshi Ishikawa2, Satoshi Hamaguchi1 (1.Osaka Univ., 2.Samsung R&D Institute Japan)

Keywords:amorphous carbon, fluorocarbon plasma, etching