[17a-313-1~10] 8.4 Plasma etching

△ [17a-313-3] Fluorocarbon radical behavior of synchronized dc-imposed pulsed plasmas for advanced dielectric etching processes

〇Toshinari Ueyama¹, Keigo Takeda¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori², Manabu Iwata³, Yoshinobu Ohya³ (1.Nagoya Univ. Eng., 2.Nagoya Univ. Inst. Innovation for Future Society, 3.Tokyo Electron Miyagi Ltd.)

Keywords:etching, pulsed plasmas, plasma diagnostics