Toshinari Ueyama

→ Search for Toshinari Ueyama in Google Scholar

Speaker, Author, Co-Author

Fri. Mar 17, 2017 9:00 AM - 11:30 AM 313 (313)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[17a-313-1~10] 8.4 Plasma etching

9:30 AM - 9:45 AM

△ [17a-313-3] Fluorocarbon radical behavior of synchronized dc-imposed pulsed plasmas for advanced dielectric etching processes

〇Toshinari Ueyama¹, Keigo Takeda¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori², Manabu Iwata³, Yoshinobu Ohya³ (1.Nagoya Univ. Eng., 2.Nagoya Univ. Inst. Innovation for Future Society, 3.Tokyo Electron Miyagi Ltd.)

▲