[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

[17a-315-15] DLC On-site Deposition by Atmospheric-Pressure Pen-like PlasmaⅡ

〇Hiroyuki Yoshiki¹, Kousuke Gando¹, Yuhei Suto¹ (1.Tsuruoka National College of Tech.)

Keywords:DLC, atmospheric-pressure microplasma, CVD

A pen-like plasma source (Plasma pen) has been proposed to achieve the on-site DLC coating. Plasma is generated by RF (13.56 MHz) excitation of a metal thin pipe electrode of Φ0.9 mm. DLC films are synthesized by plasma CVD using He/CH₄/H₂. Raman spectroscopic analysis showed a broad peak of the G-band at 1520 cm^-1 with a shoulder at 1350 cm^-1. It was found that the hardness of the film significantly depends on the H₂ addition and substrate temperature and maximum value of a surface indentation hardness HIT is 17 GPa (Hv: 1630).