The 64th JSAP Spring Meeting, 2017

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8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

Fri. Mar 17, 2017 9:00 AM - 1:00 PM 315 (315)

Akihisa Ogino(Shizuoka Univ.), Ryuta Ichiki(Oita Univ.)

10:30 AM - 10:45 AM

△ [17a-315-7] Relationship between density of atomic nitrogen and temperature of discharge tube in a remote nitrogen plasma source

〇masaharu shimabayashi1, kazuaki kurihara2, koichi sasaki1 (1.Hokkaido Univ., 2.Toshiba/Imec)

Keywords:SiC, nitrogen plasma