Photoluminescence of (ZnO)<sub>x</sub>(InN)<sub>1-x</sub> films fabricated by RF magnetron sputtering

Koichi Matsushima; Nanoka Miyahara; Kazuya Iwasaki; Daisuke Yamashita; Hyunwoong Seo; Kazunori Koga; Masaharu Shiratani; Naho Itagaki

Presentation information

Oral presentation

8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

Fri. Mar 17, 2017 9:00 AM - 1:00 PM 315 (315)

Akihisa Ogino(Shizuoka Univ.), Ryuta Ichiki(Oita Univ.)

11:15 AM - 11:30 AM

[17a-315-9] Photoluminescence of (ZnO)_x(InN)_1-x films fabricated by RF magnetron sputtering

Koichi Matsushima¹, 〇Nanoka Miyahara¹, Kazuya Iwasaki¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Kazunori Koga¹, Masaharu Shiratani¹, Naho Itagaki¹ (1.Kyushu Univ.)

Keywords:ZnInON, sputtering, photoluminescence

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Presentation information

[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

[17a-315-9] Photoluminescence of (ZnO)x(InN)1-x films fabricated by RF magnetron sputtering

[17a-315-9] Photoluminescence of (ZnO)_x(InN)_1-x films fabricated by RF magnetron sputtering