[17p-315-1~12] 8.1 Plasma production and control

[17p-315-7] Production and identification of multiply charged fullerene ion beam in ECR ion source

〇Yuto Tsuda¹, Takuro Otsuka¹, Shogo Hagino¹, Takuto Watanabe¹, Takashi Uchida², Masayuki Muramatsu³, Atsushi Kitagawa³, Yoshikazu Yoshida², Yushi Kato¹ (1.Osaka Univ., 2.Toyo Univ., 3.NIRS)

Keywords:ECR ion source