[17p-315-1~12] 8.1 Plasma production and control

[17p-315-8] The frequency dependency for production of Ar andC₆₀ ion beams from ECRIS by using 1.30/2.45GHz-band wireless microwave sources

〇Takuto Watanabe¹, Takurou Otsuka¹, Shougo Hagino¹, Yuto Tsuda¹, Kouta hamada¹, Kouji Onishi¹, Yoji Umeda¹, Tatsuto Takeda¹, Yushi Kato¹ (1.Osaka Univ.)

Keywords:Electron cyclotron resonance