Akihito Imase

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Speaker, Author, Co-Author

Fri. Sep 21, 2018 9:00 AM - 11:30 AM 145 (Reception Hall)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[21a-145-1~9] 13.3 Insulator technology

9:45 AM - 10:00 AM

[21a-145-4] SiO₂ film deposition by low temperature ALD using SiBr₄

〇Akihito Imase¹, Shigeki Matsumoto¹, Yonghua Xu¹, Masahito Shibata¹ (1.Tri Chemical Laboratories Inc.)