TsungEn Lee

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Speaker, Author, Co-Author

Wed. Sep 19, 2018 1:15 PM - 6:30 PM 234B (234-2)

Oral presentation
| 6 Thin Films and Surfaces
| 6.4 Thin films and New materials

[19p-234B-1~19] 6.4 Thin films and New materials

2:00 PM - 2:15 PM

▲ [19p-234B-4] Improvement of SiGe MOS Interfaces Properties by TiN/Y₂O₃ Gate Stacks

〇(M2)TsungEn Lee¹, Kimihiko Kato¹, Mengnan Ke¹, Mitsuru Takenaka¹, Shinichi Takagi¹ (1.Univ. of Tokyo)