Kazumasa Okamoto

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Speaker, Author, Co-Author

Wed. Sep 19, 2018 1:30 PM - 4:15 PM 234A (234-1)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.3 Micro/Nano patterning and fabrication

[19p-234A-1~10] 7.3 Micro/Nano patterning and fabrication

2:15 PM - 2:30 PM

[19p-234A-4] Radiation-Induced Primary Process of Model Molecules of Fluorinated EUV Resist

〇Kazumasa Okamoto¹, Hiroki Yamamoto², Kazuo Kobayashi¹, Takahiro Kozawa¹ (1.Osaka Univ., 2.QST)