11:15 AM - 11:30 AM
△ [20a-437-9] Organic high aspect pattern formation with 10 nm line width by controlled plasma process
〇Yusuke Fukunaga1, Takayoshi Tsutsumi1, Kenji Ishikawa1, Hiroki Kondo1, Makoto Sekine1, Masaru Hori2 (1.Nagoya Univ., 2.Nagoya Univ. Inst. Innovation for Future Society)