Atsushi Tanide

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 9:00 AM - 12:15 PM 438 (3F_Lounge)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-438-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:15 AM - 9:30 AM

[20a-438-2] Dependence of the plasma and substrate distances on the sputtering growth of GaN

〇Atsushi Tanide^1,3, Motohiro Kohno^1,3, Shigeru Takatsuji¹, Akira Horikoshi^1,3, Shohei Nakamura¹, Kazuo Kinose¹, Soichi Nadahara¹, Masazumi Nishikawa², Akinori Ebe², Kenji Ishikawa³, Masaru Hori³ (1.SCREEN Holdings, 2.EMD Corp., 3.Nagoya Univ.)

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