Toshihide Nabatame

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:30 PM - 6:30 PM 141 (141+142)

Symposium (Oral)
| Symposium
| Trends of ferroelectric HfO₂ technologies

[20p-141-1~13] Trends of ferroelectric HfO₂ technologies

2:00 PM - 2:30 PM

[20p-141-2] Formation of ferroelectric Hf_xZr₁_-xO₂ thin films using ZrO₂-seed layer

〇Toshihide Nabatame¹, Takashi Onaya^1,2,3, Naomi Sawamoto², Akihiko Ohi¹, Naoki Ikeda¹, Atsushi Ogura² (1.NIMS, 2.Meiji University, 3.JSPS Research Fellow)

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