Masakazu Kataoka

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:30 PM - 6:30 PM 141 (141+142)

Symposium (Oral)
| Symposium
| Trends of ferroelectric HfO₂ technologies

[20p-141-1~13] Trends of ferroelectric HfO₂ technologies

3:00 PM - 3:15 PM

[20p-141-4] HfO₂ Formation on Heavily Doped Si(100) Substrate by RF Magnetoron Sputtering

〇(M1)Masakazu Kataoka¹, Min Gee Kim¹, Shun-ichiro Ohmi¹ (1.Tokyo Tech)