MinGee Kim

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:30 PM - 6:30 PM 141 (141+142)

Symposium (Oral)
| Symposium
| Trends of ferroelectric HfO₂ technologies

[20p-141-1~13] Trends of ferroelectric HfO₂ technologies

3:15 PM - 3:30 PM

▼ [20p-141-5] Electrical characteristics of ferroelectric undoped HfO₂directly deposited on Si(100) utilizing Kr/O₂ sputtering

〇(D)MinGee Kim¹, Shun-ichiro Ohmi¹ (1.Tokyo Tech.)