Norifumi Fujimura

→ Search for Norifumi Fujimura in Google Scholar

Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:30 PM - 6:30 PM 141 (141+142)

Symposium (Oral)
| Symposium
| Trends of ferroelectric HfO₂ technologies

[20p-141-1~13] Trends of ferroelectric HfO₂ technologies

4:15 PM - 4:45 PM

[20p-141-8] Prospect of the HfO₂ ferroelectric thin films for the use of ferroelectric gate transistor

〇Norifumi Fujimura¹, Kenshi Takada¹, Takeshi Yoshimura¹ (1.Osaka Pref. Univ.)