Hiroyuki Ota

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:30 PM - 6:30 PM 141 (141+142)

Symposium (Oral)
| Symposium
| Trends of ferroelectric HfO₂ technologies

[20p-141-1~13] Trends of ferroelectric HfO₂ technologies

4:45 PM - 5:15 PM

[20p-141-9] Perspective and Challenges in Ferroelectric Negative Capacitance Transistors highlighted by TCAD Simulation

〇Hiroyuki Ota¹, Tsutomu Ikegami¹, Junichi Hattori¹, Hidehiro Asai¹, Koichi Fukuda¹, Kazuhiko Endo¹, Shinji Migita¹, Akira Toriumi² (1.AIST, 2.Univ. of Tokyo)