Hayato Mukai

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:45 PM - 5:15 PM 331 (International Conference Room)

Oral presentation
| 13 Semiconductors
| 13.7 Compound and power electron devices and process technology

[20p-331-1~13] 13.7 Compound and power electron devices and process technology

3:00 PM - 3:15 PM

[20p-331-6] Anisotropic wet etching of selectively grown GaN for applications to three dimensional channel transistors

〇Hayato Mukai¹, Takuya Hamada¹, Tokio Takahashi², Toshihide Ide², Mitsuaki Shimizu², Takuya Hoshii¹, Kuniyuki Kakushima¹, Hitoshi Wakabayashi¹, Hiroshi Iwai¹, Kazuo Tsutsui¹ (1.Tokyo Tech., 2.AIST)

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