Kentaro Akiyama

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Speaker, Author, Co-Author

Fri. Sep 21, 2018 1:15 PM - 5:00 PM 145 (Reception Hall)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[21p-145-1~14] 13.3 Insulator technology

2:00 PM - 2:15 PM

[21p-145-4] Fabrication of Y-Oxide Gate Stack on Ge by using Electron Beam Evaporation

〇Kentaro Akiyama¹, Kento Iseri¹, Wei-Chen Wen¹, Keisuke Yamamoto¹, Dong Wang¹, Hiroshi Nakashima² (1.IGSES, Kyushu Univ., 2.GIC, Kyushu Univ.)