Yosuke Mogami

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Speaker, Author, Co-Author

Fri. Sep 21, 2018 1:30 PM - 6:00 PM 146 (Reception Hall)

Oral presentation
| 15 Crystal Engineering
| 15.4 III-V-group nitride crystals

[21p-146-1~17] 15.4 III-V-group nitride crystals

4:15 PM - 4:30 PM

[21p-146-11] AlN template using DC sputtered AlN films with high-temperature annealing

〇Yosuke Mogami^1,2, Shogo Motegi^1,2, Atsushi Osawa³, Kazuto Osaki³, Yukitake Tanioka³, Atsushi Maeoka³, Masafumi Jo¹, Noritoshi Maeda¹, Hiroyuki Yaguchi², Hideki Hirayama¹ (1.RIKEN, 2.Saitama Univ., 3.SCREEN Finetech Solutions Co.Ltd.)

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