Masashi Kase

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Speaker, Author, Co-Author

Fri. Sep 21, 2018 1:00 PM - 4:45 PM 233 (233)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[21p-233-1~14] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

2:15 PM - 2:30 PM

[21p-233-6] Development and Characterization of Minimal Plasma tool for Metal Etching(２)

〇Masashi Kase¹, Hiroyuki Tanaka^1,3, Yoshiyuki Nozawa^2,3, Toshiyasu Hayami^2,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.SPP Technologies)

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