The 79th JSAP Autumn Meeting, 2018

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Symposium (Oral)

Symposium » New Process Technology of Nitride Semiconductors

[18p-146-1~8] New Process Technology of Nitride Semiconductors

Tue. Sep 18, 2018 1:30 PM - 6:00 PM 146 (Reception Hall)

Motoaki Iwaya(Meijo Univ.), Yoshinao Kumagai(TUAT)

3:00 PM - 3:30 PM

[18p-146-4] Damage-free Polishing of GaN Substrate Using Catalyst-referred Etching

〇Yasuhisa Sano1, Kenta Arima1, Kazuto Yamauchi1 (1.Osaka Univ.)

Keywords:Gallium nitride, Polishing, CARE