The 79th JSAP Autumn Meeting, 2018

Presentation information

Print

Oral presentation

8 Plasma Electronics » 8.7 Plasma Electronics Invited Talk

[19a-141-9~9] 8.7 Plasma Electronics Invited Talk

Wed. Sep 19, 2018 11:45 AM - 12:15 PM 141 (141+142)

Mineo Hiramatsu(Meijo Univ.)

11:45 AM - 12:15 PM

[19a-141-9] [INVITED] Plasma etching technology for semiconductor device manufacturing and expectation for innovation

〇Hisataka Hayashi1 (1.Toshiba Memory)

Keywords:semiconductor, plasma, etching