The 79th JSAP Autumn Meeting, 2018

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Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[19a-146-1~12] 15.4 III-V-group nitride crystals

Wed. Sep 19, 2018 9:00 AM - 12:15 PM 146 (Reception Hall)

Kazunobu Kojima(Tohoku Univ.), Mitsuru Funato(Kyoto Univ.)

9:30 AM - 9:45 AM

[19a-146-3] AlN Molar Fraction Dependence of TMAH Wet Etching on AlGaN

〇(M1)Shinji Yasue1, Kosuke Sato1,3, Yuta Kawase1, Junya Ikeda1, Yusuke Sakuragi1, Sho Iwayama1, Motoaki Iwaya1, Satoshi Kamiyama1, Tetsuya Kamiyama1, Isamu Akasaki1,2 (1.Meijo Univ., 2.Nagoya Univ., 3.Asahi-Kasei)

Keywords:semiconductor, wet etching