[19a-234B-1~9] 6.4 Thin films and New materials

[19a-234B-7] High-rate deposition of chromium oxide thin films by water vapor sputtering

〇Fan Wang¹, Yoshio Abe¹, Midori Kawamura¹, Kyung Ho Kimu¹, Takayuki Kiba¹ (1.Kitami Inst.)

Keywords:chromium oxide, High speed sputter deposition, Target voltage

In this study,improvement of the deposition rate of chromium oxide thin films was investigated by reactive sputtering using water vapor .Water vapor was injected toward a target and a cold trap was installed in a sputtering system.In the case of using cold trap, water vapor partial pressure in the chamber decreased .Chromium oxide films are considered to be formed at high deposition rate under a metallic target mode.