The 79th JSAP Autumn Meeting, 2018

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[19a-234B-1~9] 6.4 Thin films and New materials

Wed. Sep 19, 2018 9:15 AM - 11:45 AM 234B (234-2)

Yoshinobu Nakamura(Univ. of Tokyo)

11:30 AM - 11:45 AM

[19a-234B-9] IrOx based Electrochromic films deposited by rf sputtering

〇Yuna Suga1, Tsutomu Kato1, Junjun Jia1, Koukichi Tomimoto2, Yuki Oguchi2, Shinichi Nakamura2, Yuzo Shigesato1 (1.AoyamaGakuin Univ., 2.CAT)

Keywords:iridium oxide, electrochromism, sputtering