[19a-311-1~12] 17.3 Layered materials

[19a-311-11] Influence of Reactive Ion Etching on Exfoliated Thin Films of Layered Material NbSe₂

〇(M2)Naoki Hoshi¹, Daisuke Yabe¹, Hikari Tomori¹, Kenji Watanabe², Takashi Taniguchi², Akinobu Kanda¹ (1.Univ. Tsukuba, 2.NIMS)

Keywords:layered materials, chalcogenide

We investigated the influence of the microfabrication using reactive ion etching (RIE) on the electron transport of exfoliated thin films of superconducting transition metal dichalcogenide NbSe₂. We observed dramatic increase of the resistivity at room temperature, decrease of the superconducting transition temperature, and increase of the superconducting transition width due to RIE. These results indicate that the RIE induces defects in exfoliated NbSe₂ thin films.