The 79th JSAP Autumn Meeting, 2018

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15 Crystal Engineering » 15.7 Crystal characterization, impurities and crystal defects

[19p-131-1~15] 15.7 Crystal characterization, impurities and crystal defects

Wed. Sep 19, 2018 1:30 PM - 5:45 PM 131 (131+132)

Kentaro Kutsukake(Nagoya Univ.), Toshinori Taishi(Shinshu Univ.), Yasuo Shimizu(Tohoku Univ.)

3:45 PM - 4:00 PM

[19p-131-9] Cathodoluminescence evaluation of boron ion implantation damage in silicon wafers

〇Satoko Nakagawa1, Toshiro Minami1, Takashi Ishikawa1, Shin-ichi Nishizawa2 (1.GlobalWafers Japan, 2.Kyushu Univ.)

Keywords:silicon, CL