[19p-133-1~19] 6.1 Ferroelectric thin films

[19p-133-9] Epitaxial film synthesis of Fe₂Mo₃O₈ using pulsed laser deposition

〇Shishin Mo¹, Tsukasa Katayama¹, Akira Chikamatsu¹, Shintaro Yasui², Mitsuru Itoh², Tetsuya Hasegawa¹ (1.Univ. of Tokyo, 2.Tokyo Tech.)

Keywords:multiferroics, oxide thin film, pulse laser deposition

Fe₂Mo₃O₈ (FMO), a multiferroic material, has been actively studied in recent years because of its large electromagnetic effect. In such a multiferroic material, it is expected that physical properties can be extended as a thin film on a single crystal substrate. Therefore, in this research, FMO epitaxial thin film is fabricated on various substrates and their structures and physical properties were investigated. As a result, tensile and compressive strain was given to the FMO thin film while the most stable magnetic ordered phase and the change of Curie temperature were observed.