6:00 PM - 6:15 PM
△ [19p-234B-18] Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (2)
Keywords:optical thin film, low refractive index, silicon dioxide
Oral presentation
6 Thin Films and Surfaces » 6.4 Thin films and New materials
Wed. Sep 19, 2018 1:15 PM - 6:30 PM 234B (234-2)
Tetsuo Tsuchiya(AIST), Taro Hitosugi(Tokyo Tech), Yuji Muraoka(Okayama Univ.)
6:00 PM - 6:15 PM
Keywords:optical thin film, low refractive index, silicon dioxide