The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

13 Semiconductors » 13.7 Compound and power electron devices and process technology

[19p-CE-5~17] 13.7 Compound and power electron devices and process technology

Wed. Sep 19, 2018 3:00 PM - 6:45 PM CE (Century Hall)

Masashi Kato(NITech), Taketomo Sato(Hokkaido Univ.)

5:00 PM - 5:15 PM

[19p-CE-11] Evaluation of Mg-implanted GaN by cathode luminescence

Susumu Saitoh1, Takahasi Kazuteru1, Salmon Michael E.2, Shingu Kazue1 (1.Nano Science Corp., 2.EAG Inc.)

Keywords:cathode luminescence, GaN, Ion implantation

Mg implanted GaN is evaluated by cathode luminescence method in cross section to assess depth profile of optical property. CL panchromatic intensity decreases even in samples after annealing. Ratio of yellow luminescence to near band edge luminescence is independent to CL intensity and results consistent depth profile which is correlate to Mg local concentration obtained by SIMS. It means YL/NBE is useful to indicate local status of GaN crystal effectively.