[19p-PB1-1~37] 6.3 Oxide electronics

[19p-PB1-32] Fabrication p-type transparent thin film transistors using NiO thin films deposited by RF sputtering without intentional heating

〇Hiroaki Okada¹, Ryo Tanuma¹, Mutsumi Sugiyama^1,2 (1.Faculty of Sci. & Tech. Tokyo Univ. of Sci., 2.RIST Tokyo Univ. of Sci.)

Keywords:thin film transistor, Nickel Oxide, p-type