Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation

Naoki Nishioka; Yuji Umeda; Yusuke Hunamoto; Daichi Shima; Hiroyuki Kuramae; Tomosumi Kamimura; Hideo Horibe; Masashi Yoshimura; Ryosuke Nakamura

Presentation information

Oral presentation

3 Optics and Photonics » 3.7 Laser processing

[20a-224A-1~10] 3.7 Laser processing

Thu. Sep 20, 2018 9:00 AM - 11:45 AM 224A (224-1)

Masaaki Sakakura(Univ. of Southampton), Shuntaro Tani(Univ. of Tokyo)

9:30 AM - 9:45 AM

[20a-224A-3] Time-resolved Analysis of Resist Stripping Phenomenon Using Laser Irradiation

〇(B)Naoki Nishioka^1,2, Yuji Umeda¹, Yusuke Hunamoto¹, Daichi Shima¹, Hiroyuki Kuramae¹, Tomosumi Kamimura¹, Hideo Horibe³, Masashi Yoshimura², Ryosuke Nakamura² (1.Osaka Inst Tech Univ., 2.Osaka Univ., 3.Osaka City Univ.)

Keywords:optics, Laser damage

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