[20a-225B-1~11] 【CS.4】 Code-sharing Session of 3.11 & 3.12

△ [20a-225B-7] Suppression of Thermal Oxidation of TiN Nanocylinder Arrays by Atomic Layer Deposition of Refractory Dielectric Layers

〇(M1)Shinya Goya¹, Shunsuke Murai¹, Koji Fujita¹, Katsuhisa Tanaka¹ (1.Kyoto Univ.)

Keywords:atomic layer deposition, titanium nitride, thermal stability

Titanium nitride (TiN) nanocylinder arrays were fabricated on silica glass substrates, and covered with aluminium oxide (Al₂O₃) or silicon nitride (Si₃N₄) layers by using ALD method. These samples were annealed at various temperatures under an atmospheric environment. Optical transmittance showed that thermal stability of TiN nanocylinder arrays was improved by the coating of dielectric layers. SEM images showed that the shapes of nanocyliders were maintained after heating.