Electrical and optical properties of ATO thin films fabricated by mist CVD

Mariko Ueda; Li Liu; Shota Sato; Giang Dang; Toshiyuki Kawaharamura; Fujita Shizuo; Hiroyuki Orita; Takahiro Hiramatsu

Presentation information

Oral presentation

21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20a-234A-1~11] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Thu. Sep 20, 2018 9:00 AM - 12:00 PM 234A (234-1)

Takashi Yasuda(Ishinomaki Senshu Univ.)

9:30 AM - 9:45 AM

[20a-234A-3] Electrical and optical properties of ATO thin films fabricated by mist CVD

〇(M1)Mariko Ueda¹, Li Liu¹, Shota Sato¹, Giang Dang², Toshiyuki Kawaharamura^1,2, Fujita Shizuo³, Hiroyuki Orita⁴, Takahiro Hiramatsu⁴ (1.School of Intelligent. Mech. Sys. Eng., Kochi Univ. of Tech., 2.Res.Inst., Kochi Univ. of Tech., 3.Kyoto Univ., 4.Toshiba Mitsubishi-Electric Industrial Systems)

Keywords:mist CVD, Transparent Conducting Oxides, Antimony doped Tin Oxide