The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-438-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Thu. Sep 20, 2018 9:00 AM - 12:15 PM 438 (3F_Lounge)

Shota Nunomura(AIST)

9:00 AM - 9:15 AM

[20a-438-1] Generation and analysis of ZnO nanoparticles using sputtering and laser

Wataru Wakaki1, Akio Sanpei1, Noriyuki Hasuike1, Susumu Kamoi2, Kenji Kisoda3 (1.Kyoto Ins. of Tech., 2.Kyoto Tech. Center, 3.Wakayama Univ.)

Keywords:Zinc Oxide, sputtering, laser

RF sputtering was performed using zinc oxide (ZnO) as a target, and ZnO nanoparticles were successfully formed by irradiating the laser during sputtering. The nanoparticles were not observed by ordinary sputtering, and the produced nanoparticles were observed by SEM and the particle size and number density were analyzed. In addition, the irradiation time dependence and wavelength dependence of laser in nanoparticles were measured and investigated.