9:30 AM - 9:45 AM
[20a-438-3] ITO thin films fabricated by hybrid facing cathode sputtering using rf-dc coupled power supply
Keywords:hybrid facing cathode sputtering, rf-dc coupled power supply
Presentation information
Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
[20a-438-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Thu. Sep 20, 2018 9:00 AM - 12:15 PM 438 (3F_Lounge)
Shota Nunomura(AIST)