[20a-PA1-1~11] 7 Beam Technology and Nanofabrication (Poster)

[20a-PA1-7] Change in Extracted Ion Species due to Operation History of a Plasma-Sputter-Type Ion Source

〇Kentaro Yoshioka¹, Takeshi Sakamoto¹, Toshiro Kasuya¹, Motoi Wada¹ (1.Doshisha Univ.)

Keywords:sputtering, ion beam, reactive plasma

A planar magnetron sputter type ion source has been operated in both DC and RF sputtering modes to investigate the aluminum-nitride ion (AlN⁺) production. The test of ion beam extraction indicated that effects of source operation history contribued to the stable production of AlN⁺. Continuous beam extraction was conducted in the successive interval switching gases between Ar and N₂. The results showed AlN⁺ beam current depending upon the AlN layer formed on source inner wall.