[20a-PA5-1~14] 13.3 Insulator technology

[20a-PA5-11] Fabrication and Characteristics Improvement of Silicon Nitride Thin Film on Silicon Substrate by Microwave Plasma

〇Syunpei Ogawa¹, Tatsuya Kuroda¹, Yasuyuki Kato¹, Kazuhiro Niwa¹, Hiroki Ishizaki¹ (1.Saitama Institute of Technology)

Keywords:silicon nitride film, gate insulator, microwave plasma