[20a-PA5-1~14] 13.3 Insulator technology

[20a-PA5-5] Characterization of the multiple thin oxide films and interfaces on Si by PEALD

〇Yusaku Tanahashi¹, Shingo Ogawa¹, Keiko Inoue¹, Tomomi Sugimoto¹, Yumiko Shimizu¹, Shino Kosaka¹, Hirofumi Seki¹ (1.Toray Research Center, Inc.)

Keywords:analysis evaluate, thin film, interface