The 79th JSAP Autumn Meeting, 2018

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Oral presentation

6 Thin Films and Surfaces » 6.2 Carbon-based thin films

[20p-222-1~23] 6.2 Carbon-based thin films

Thu. Sep 20, 2018 1:15 PM - 7:30 PM 222 (222)

Masami Aono(National Defence Academy), Toru Harigai(Toyohashi Univ. of Tech.), Tokuyuki Teraji(NIMS), Yukako Kato(AIST)

6:00 PM - 6:15 PM

[20p-222-18] Fabrication and structural analysis of high-nitrogen containing a-CNx:H thin films using the radio-frequency plasma CVD of the gas mixture of the organic compound, N2 and Ar

〇Yoshiki Iizawa1, Hidetoshi Saito1, Haruhiko Ito1 (1.Nagaoka Univ of Tech)

Keywords:carbon nitride, plasma CVD, thin film