The 79th JSAP Autumn Meeting, 2018

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Symposium (Oral)

Symposium » Current status and future prospect of atomic layer processes

[20p-223-1~11] Current status and future prospect of atomic layer processes

Thu. Sep 20, 2018 1:45 PM - 6:45 PM 223 (223)

Makoto Sekine(Nagoya Univ.), Takeshi Momose(Univ. of Tokyo), Daisuke Hojo(AIST), Kazuhiro Karahashi(Osaka univ.)

1:45 PM - 2:15 PM

[20p-223-1] Chemical reaction engineering of ALD/CVD processes

〇Yukihiro Shimogaki1 (1.The Univ. Tokyo)

Keywords:Atomic Layer Deposition, Chemical Vapor Deposition, Chemical Reaction Engineering

The ALD / CVD processes are indispensable technologies for fabrication of functional thin films. Compared to PVD processes such as sputtering, it is characterized by uniform film formation in fine trenches and pores with high aspect ratio. However, uniform film formation and high-speed film growth are incompatible, so optimization based on detailed understanding of reaction mechanism is necessary. In this presentation, reaction mechanism analysis of ALD / CVD processes and optimum process design will be discussed based on the viewpoint of chemical reaction engineering.