The 79th JSAP Autumn Meeting, 2018

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Symposium (Oral)

Symposium » Current status and future prospect of atomic layer processes

[20p-223-1~11] Current status and future prospect of atomic layer processes

Thu. Sep 20, 2018 1:45 PM - 6:45 PM 223 (223)

Makoto Sekine(Nagoya Univ.), Takeshi Momose(Univ. of Tokyo), Daisuke Hojo(AIST), Kazuhiro Karahashi(Osaka univ.)

6:00 PM - 6:15 PM

[20p-223-9] Fluorocarbon-Assisted Atomic Layer Etching for Si-Based Materials

〇Takayoshi Tsutsumi1, Hiroki Kondo1, Kenji Ishikawa1, Makoto Sekine1, Nobuyoshi Kobayashi2, Masaru Hori3 (1.Nagoya Univ. Eng., 2.ASM Japan K.K., 3.Nagoya Univ. Inst. Innovation for Future Society)

Keywords:atomic layer etching, fluorocarbon, plasma