The 79th JSAP Autumn Meeting, 2018

Presentation information

Symposium (Oral)

Symposium » Advanced ion microscopy for future nanoelectronics materials and devices

[20p-233-1~10] Advanced ion microscopy for future nanoelectronics materials and devices

Thu. Sep 20, 2018 1:30 PM - 6:00 PM 233 (233)

Reo Kometani(Univ. of Tokyo), Shinichi Ogawa(AIST)

1:30 PM - 2:00 PM

[20p-233-1] Imaging, Modification, and Analysis of Nanostructures with the Helium Ion Microscope

Armin Goelzhaeuser1 (1.Bielefeld University)

Keywords:Helium Ion Microscopy, Carbon Nanomembranes, Focussed Ion Beams

The Helium Ion Microscope (HIM) utilizes a focused beam of He+ ions to image and modify materials with high spatial resolution and chemical sensitivity [1]. A HIM operates similar to a Scanning Electron Microscope (SEM). However, its helium ion beam can be focused into a smaller region than an electron beam, and a HIM is thus capable to resolve features down to 0.25 nm. HIM images thus show much stronger chemical and topographical contrasts than SEM images. HIM is further capable to image insulating samples without special treatment. This allows the investigation of biomaterials and cell surfaces. The HIM can be also used for the modification and the milling of materials.
The presentation will review principles of HIM and contain examples of HIM imaging and lithography with a particular focus on 2D materials. 1 nm thick carbon nanomembranes (CNMs) with a controlled thickness and porosity are investigated. HIM images provide valuable information to understand the structure of CNMs and their formation. The capability of the HIM for nanolithography will be shown by milling of 2D materials, where nanopores with diameters down to 1.3 nm were fabricated. HIM imaging of different carbon materials from soot particles to biological cells will be presented and discussed.
[1] G. Hlawacek and A. Gölzhäuser (Ed.): Helium Ion Microscopy, Springer-International (2016).