2018年第79回応用物理学会秋季学術講演会

講演情報

シンポジウム(口頭講演)

シンポジウム » ナノエレクトロニクス材料・デバイス研究開発を目指した先端イオン顕微鏡技術

[20p-233-1~10] ナノエレクトロニクス材料・デバイス研究開発を目指した先端イオン顕微鏡技術

2018年9月20日(木) 13:30 〜 18:00 233 (233)

米谷 玲皇(東大)、小川 真一(産総研)

14:15 〜 14:45

[20p-233-3] Graphene nanoelectromechanical (GNEM) devices functionalized by using helium ion beam for nanoscale thermal engineering

Hiroshi Mizuta1,4、Mayeesha Hauqe1、Seiya Kubo1、Mikio Koyano1、Yoshifumi Oshima1、Manoharan Muruganathan1、Yusuke Arashida2、Ikufumi Katayama2、Jun Takeda2、Shinichi Ogawa3、Marek Schmidt1 (1.JAIST、2.YNU、3.AIST、4.Hitachi Cambridge Lab)

キーワード:graphene, phononic crystal, nanofabrication

We report on our recent progress of single-nanometer-scale patterning of suspended graphene structures by using focused helium ion beam of sub-1-nm in diameter and their applications to heat phonon engineering. We demonstrate the technique to fabricate graphene phononic crystals (GPnCs) with the two-dimensional array of 3-4 nm pores with the pitch down to 10 nm on multi-scale suspended graphene channels ranging from 100 nm to a few microns in length and width. We also briefly introduce simulation and characterization techniques for electronic and phonic states in GPnCs and discuss the possibility of GPnC-based thermal rectification devices.