The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20p-234A-1~18] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Thu. Sep 20, 2018 1:30 PM - 6:30 PM 234A (234-1)

Masataka Higashiwaki(NICT), Tetsuya Yamamoto(Kochi Univ. of Tech.), Mutsumi Kimura(Ryukoku Univ.)

1:30 PM - 1:45 PM

[20p-234A-1] [Young Scientist Presentation Award Speech] Epitaxial growth and bandgap engineering of β-(Ga1-yScy)2O3 films by PLD

Ryo Wakabayashi1, Kohei Yoshimatsu1, Akira Ohtomo1,2 (1.Tokyo Tech., Dept. Chem. Sci. Eng., 2.MCES)

Keywords:Ga2O3, Alloy, Epitaxial growth

今回更なる物性評価に向けてよりSc組成を高めたβ-(Ga1-yScy)2O3薄膜の成長を行い,Egは5.45 eV (y = 0.32) まで増加することを明らかにした.またβ-(AlxGa1-x)2O3薄膜と比較して,固溶量に対してより大きなEg増加が見られた.