2018年第79回応用物理学会秋季学術講演会

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一般セッション(口頭講演)

8 プラズマエレクトロニクス » 8.2 プラズマ成膜・エッチング・表面処理

[20p-438-1~21] 8.2 プラズマ成膜・エッチング・表面処理

2018年9月20日(木) 13:45 〜 19:15 438 (3Fラウンジ)

石川 健治(名大)、大村 光広(東芝メモリ)

16:00 〜 16:15

[20p-438-10] Physical etching of surfaces made of Lennard-Jones atoms: a Molecular Dynamics study

Nicolas Aini Mauchamp1、Michiro Isobe1、Satoshi Hamaguchi1 (1.Osaka University)

キーワード:MD simulations, Lennard-Jones

Collision cascade dynamics has been widely studied experimentally and theoretically. However, even for particles interacting via simple two-body potential functions such as Lennard-Jones potential functions, the exact dependence of the sputtering yield on the potential functions has not been well understood yet. The goal of this study is to evaluate the sputtering yield of a surface made of particles interacting with Lenard-Jones potential by the injection of energetic particles of fully repulsive interaction.