The 79th JSAP Autumn Meeting, 2018

Presentation information

Print

Oral presentation

13 Semiconductors » 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[21p-135-1~16] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

Fri. Sep 21, 2018 1:00 PM - 5:15 PM 135 (135)

Tomo Ueno(TUAT), Koichiro Saga(Sony)

4:15 PM - 4:30 PM

[21p-135-13] Visualization of real contact area of PVA brush using total reflected light

〇(M2)Masanao Hanai1, Toshiyuki Sanada1, Hirokuni Hiyama2, Akira Fukunaga2 (1.Shizuoka Univ., 2.Ebara Corp.)

Keywords:PVA brush, post CMP cleaning, real contact area

Scrub cleaning with PVA brushes is widely used in the post CMP cleaning process for semiconductor device manufacturing. The cleaning mechanism is greatly depended on the contact condition. In this study, we observed the real contact area using optical device to understand the contact condition. As a result, we confirmed that contact points concentrated in the front part for moving direction when sliding the brush on surfaces. It was also found that the amount of real contact area depended on the type of PVA brush.