The 79th JSAP Autumn Meeting, 2018

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[21p-145-1~14] 13.3 Insulator technology

Fri. Sep 21, 2018 1:15 PM - 5:00 PM 145 (Reception Hall)

Keisuke Yamamoto(Kyushu Univ.), Yasushi Hotta(Univ. of Hyogo)

4:15 PM - 4:30 PM

[21p-145-12] Capacitance-voltage characteristics of HfO2 MIM capacitors with Si incorporation

〇(B)Haruki Iwatsuka1, Takuya Hosii1, Iriya Muneta1, Hitoshi Wakabayashi1, Kazuo Tsutsui1, Kuniyuki Kakushima1 (1.Tokyo Inst.)

Keywords:semiconductor, HfO2, characteristic of capacitance